X-ray total external reflection fluorescence study of LB films on solid substrate
S I Zheludeva; M V Kovalchuk; N N Novikova; A N Sosphenov; V E Erochin; L A Feigin; S I Zheludeva; A.V. Shubnikov Inst. of Crystallogr., Russian Acad. of Sci., Moscow, Russia; M V Kovalchuk; A.V. Shubnikov Inst. of Crystallogr., Russian Acad. of Sci., Moscow, Russia; N N Novikova; A.V. Shubnikov Inst. of Crystallogr., Russian Acad. of Sci., Moscow, Russia; A N Sosphenov; A.V. Shubnikov Inst. of Crystallogr., Russian Acad. of Sci., Moscow, Russia; V E Erochin; A.V. Shubnikov Inst. of Crystallogr., Russian Acad. of Sci., Moscow, Russia; L A Feigin; A.V. Shubnikov Inst. of Crystallogr., Russian Acad. of Sci., Moscow, Russia
Журнал:
Journal of Physics D: Applied Physics
Дата:
1993-04-14
Аннотация:
The distribution of heavy ions inside a thin LB film and the structure perfection of organic layers have been studied by registering fluorescence excited by X-ray evanescent/standing wave fields under conditions of total external reflection. The possibility of the application of new complicated artificial multilayer systems as substrates for structure characterization of LB films deposited on them was revealed.
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