Fabrication of thin-film microcircuits on curved substrates
W A Seed; W A Seed; Physiological Flow Studies Unit, Department of Aeronautics Imperial College, London
Журнал:
Journal of Physics E: Scientific Instruments
Дата:
1969-02-01
Аннотация:
A technique is described which allows accurate selective etching of thin metal films deposited on substrates with a single curvature, of radius down to 0·5 mm, for the production of resistive microcircuits.
148.5Кб