| Автор | W A Seed |
| Дата выпуска | 1969-02-01 |
| dc.description | A technique is described which allows accurate selective etching of thin metal films deposited on substrates with a single curvature, of radius down to 0·5 mm, for the production of resistive microcircuits. |
| Формат | application.pdf |
| Издатель | Institute of Physics Publishing |
| Название | Fabrication of thin-film microcircuits on curved substrates |
| Тип | note |
| DOI | 10.1088/0022-3735/2/2/425 |
| Print ISSN | 0022-3735 |
| Журнал | Journal of Physics E: Scientific Instruments |
| Том | 2 |
| Первая страница | 206 |
| Последняя страница | 206 |
| Аффилиация | W A Seed; Physiological Flow Studies Unit, Department of Aeronautics Imperial College, London |
| Выпуск | 2 |
