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Автор W-L Chang
Автор H-J Pan
Автор W-C Wang
Автор K-B Thei
Автор W-S Lour
Автор W-C Liu
Дата выпуска 1999-10-01
dc.description The influences of the mesa-sidewall effect on dc and RF performances of Ga<sub>0.51</sub>In<sub>0.49</sub>P/In<sub>0.15</sub>Ga<sub>0.85</sub>As pseudomorphic high electron mobility transistors are studied and demonstrated. The leakage current path and parasitic capacitance induced from mesa-sidewalls seriously affect the device characteristics, including the excessive gate leakage current, the reduced breakdown voltage, the degraded RF current gain frequency and the increased sidegating effect.
Формат application.pdf
Издатель Institute of Physics Publishing
Название Influences of the mesa-sidewall effect on Ga<sub>0.51</sub>In<sub>0.49</sub>P/In<sub>0.15</sub>Ga<sub>0.85</sub>As pseudomorphic transistors
Тип paper
DOI 10.1088/0268-1242/14/10/301
Electronic ISSN 1361-6641
Print ISSN 0268-1242
Журнал Semiconductor Science and Technology
Том 14
Первая страница 887
Последняя страница 891
Выпуск 10

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