Resonant interband tunnelling in homoepitaxial InSb structures with inversion barriers
J Brunner; R A Stradling; I T Ferguson; E A Johnson; A McKinnon; F Coppinger; A Rivers; F Koch; J Brunner; Imperial Coll. of Sci., Technol. & Med., London, UK; R A Stradling; Imperial Coll. of Sci., Technol. & Med., London, UK; I T Ferguson; Imperial Coll. of Sci., Technol. & Med., London, UK; E A Johnson; Imperial Coll. of Sci., Technol. & Med., London, UK; A McKinnon; Imperial Coll. of Sci., Technol. & Med., London, UK; F Coppinger; Imperial Coll. of Sci., Technol. & Med., London, UK; A Rivers; Imperial Coll. of Sci., Technol. & Med., London, UK; F Koch; Imperial Coll. of Sci., Technol. & Med., London, UK
Журнал:
Semiconductor Science and Technology
Дата:
1991-10-01
Аннотация:
Resonant interband tunnelling through doping barriers in homoepitaxial InSb is observed. The band structures for the chosen doping profiles are calculated self-consistently including non-parabolicity effects. A p<sup>+</sup>- delta p<sup>+</sup>-i-n<sup>+</sup>-i- delta p<sup>+</sup>-p<sup>+</sup> doping structure is designed to create a two-dimensional triangular inversion well between two degenerate p-type slab layers. Holes in the p-type layer then tunnel resonantly through the two-dimensional occupied electron states of the n<sup>+</sup>-induced well into the collector on the other side. These structures exhibit symmetric negative differential resistance (NDR) with peak-to-valley ratios of 1.6 and peak current densities of 120 A cm<sup>-2</sup> at 4.2 K.
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