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Автор M P Houng
Автор Y H Wang
Автор H C Wei
Дата выпуска 1991-09-01
dc.description AlGaAs/GaAs heterojunction resonant tunnelling bipolar transistors, with superlattice base, have been fabricated. For the single heterojunction structure an S-shaped NDR behaviour can be obtained when it is forward biased, due to the impact ionization enhancement in the AlGaAs/GaAs heterojunction. While it is reverse biased an N-shaped NDR behaviour comes after an insignificant S-shaped behaviour. It is believed to be the initiation of a resonant tunnelling process across the superlattice region. As for the double heterojunction structure, the I-V characteristic shows a bi-directional S-shaped switching behaviour. The different performance between the two structures can be modelled as the effect of the band offset of the heterojunction.
Формат application.pdf
Издатель Institute of Physics Publishing
Название The effect of band offset on the negative differential resistance characteristics of GaAs resonant tunnelling devices
Тип paper
DOI 10.1088/0268-1242/6/9/009
Electronic ISSN 1361-6641
Print ISSN 0268-1242
Журнал Semiconductor Science and Technology
Том 6
Первая страница 886
Последняя страница 889
Аффилиация M P Houng; Dept. of Electr. Eng., Nat. Cheng-Kung Univ., Tainan, Taiwan
Аффилиация Y H Wang; Dept. of Electr. Eng., Nat. Cheng-Kung Univ., Tainan, Taiwan
Аффилиация H C Wei; Dept. of Electr. Eng., Nat. Cheng-Kung Univ., Tainan, Taiwan
Выпуск 9

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