Advances in etching of semiconductor devices
R. Tijburg; R. Tijburg; Philips Res. Labs., Eindhoven, Netherlands
Журнал:
Physics in Technology
Дата:
1976-09-01
Аннотация:
Etching is an important stage in semiconductor device fabrication. After a general survey, some recent advances in etching techniques based on a better understanding of the processes involved are discussed. They relate to selective and preferential etching. The choice of etchant is also considered
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