| Автор | R. Tijburg |
| Дата выпуска | 1976-09-01 |
| dc.description | Etching is an important stage in semiconductor device fabrication. After a general survey, some recent advances in etching techniques based on a better understanding of the processes involved are discussed. They relate to selective and preferential etching. The choice of etchant is also considered |
| Формат | application.pdf |
| Издатель | Institute of Physics Publishing |
| Название | Advances in etching of semiconductor devices |
| Тип | paper |
| DOI | 10.1088/0305-4624/7/5/I03 |
| Print ISSN | 0305-4624 |
| Журнал | Physics in Technology |
| Том | 7 |
| Первая страница | 202 |
| Последняя страница | 207 |
| Аффилиация | R. Tijburg; Philips Res. Labs., Eindhoven, Netherlands |
| Выпуск | 5 |
