| Автор | V I Dediu |
| Автор | Q D Jiang |
| Автор | F C Matacotta |
| Автор | P Scardi |
| Автор | M Lazzarino |
| Автор | G Nieva |
| Автор | L Civale |
| Дата выпуска | 1995-03-01 |
| dc.description | Channel-spark pulsed electron beam deposition (CS), a new deposition method based on a simple and inexpensive system, has been used for preparation of high-quality GdBa<sub>2</sub>Cu<sub>3</sub>O<sub>7-x</sub>, Gd<sub>1-x</sub>Eu<sub>x</sub>Ba<sub>2</sub>Cu<sub>3</sub>O<sub>7-x</sub> and YBa<sub>2</sub>Cu<sub>3</sub>O<sub>7-x</sub> thin films epitaxially grown on NdGaO<sub>3</sub> and SrTiO<sub>3</sub> substrates. Typical critical temperatures for zero DC resistance lie in the intervals 87-89 K for Y-based films and 91.0-92.6 K for Gd- and GdEu-based ones. The transition widths for the best films are less than 0.5 K. The critical current densities reach the values of 3*10<sup>6</sup> A cm<sup>-2</sup> at 77 K, zero field. |
| Формат | application.pdf |
| Издатель | Institute of Physics Publishing |
| Название | Deposition of MBa<sub>2</sub>Cu<sub>3</sub>O<sub>7-x</sub> thin films by channel-spark method |
| Тип | paper |
| DOI | 10.1088/0953-2048/8/3/005 |
| Electronic ISSN | 1361-6668 |
| Print ISSN | 0953-2048 |
| Журнал | Superconductor Science and Technology |
| Том | 8 |
| Первая страница | 160 |
| Последняя страница | 164 |
| Аффилиация | V I Dediu; HTS Lab., ICTP, Trieste, Italy |
| Аффилиация | Q D Jiang; HTS Lab., ICTP, Trieste, Italy |
| Аффилиация | F C Matacotta; HTS Lab., ICTP, Trieste, Italy |
| Аффилиация | P Scardi; HTS Lab., ICTP, Trieste, Italy |
| Аффилиация | M Lazzarino; HTS Lab., ICTP, Trieste, Italy |
| Аффилиация | G Nieva; HTS Lab., ICTP, Trieste, Italy |
| Аффилиация | L Civale; HTS Lab., ICTP, Trieste, Italy |
| Выпуск | 3 |
