Electron transport in NiCr-O thin films at low temperatures
H Dintner; A Heinrich; C Gladun; R Mattheis; H Dintner; Akad. der Wissenschaften, Phys.-Tech. Inst., Jena, East Germany; A Heinrich; Akad. der Wissenschaften, Phys.-Tech. Inst., Jena, East Germany; C Gladun; Akad. der Wissenschaften, Phys.-Tech. Inst., Jena, East Germany; R Mattheis; Akad. der Wissenschaften, Phys.-Tech. Inst., Jena, East Germany
Журнал:
Journal of Physics: Condensed Matter
Дата:
1989-12-25
Аннотация:
Starting from measurements of the DC conductivity sigma (T) in the temperature range from 0.05 to 300 K, the authors can qualitatively describe the electron transport in NiCr-O thin films at low temperatures by its dependence on the atomic oxygen concentration c<sub>O</sub>. At a critical value of c<sub>O</sub> a metal-insulator transition occurs near T=0. In the metallic region the electrical behaviour can be interpreted in terms of weakly localised electrons including electron correlation. In the non-metallic region an activated temperature dependence is found which is due to variable-range hopping of strongly localised electrons.
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