A FIM atom probe study of vanadium oxidation
R P Setna; T J Godfrey; G D W Smith; R P Setna; Dept. of Metall. & Sci. of Mater., Oxford Univ., UK; T J Godfrey; Dept. of Metall. & Sci. of Mater., Oxford Univ., UK; G D W Smith; Dept. of Metall. & Sci. of Mater., Oxford Univ., UK
Журнал:
Journal of Physics: Condensed Matter
Дата:
1989-10-01
Аннотация:
Vanadium specimens have been prepared and imaged for the first time in the field ion microscope. The composition of oxide films formed on vanadium at temperatures between 290 and 473 K has been determined by atom probe microanalysis. It is shown that the outer oxide film has a composition close to V<sub>2</sub>O<sub>3</sub> in this temperature range, and that an intermediate layer of suboxide of composition approximately V<sub>9</sub>O forms between the outer oxide and the metallic substrate. Appreciable solubility of oxygen in the vanadium metal matrix is also observed.
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