| Автор | Pascal Brault |
| Автор | Philippe Dumas |
| Автор | Franck Salvan |
| Дата выпуска | 1998-01-12 |
| dc.description | Atomic force microscopy reveals scaling behaviour of silicon surfaces etched by plasma. The experimental results are compared with some theoretical models. It is shown that plasma-induced roughness is driven by a phenomenon that can be described by shadowing instabilities resulting in columnar microstructure growth. The same scaling properties as are predicted by a growth model are obtained. |
| Формат | application.pdf |
| Издатель | Institute of Physics Publishing |
| Название | Roughness scaling of plasma-etched silicon surfaces |
| Тип | lett |
| DOI | 10.1088/0953-8984/10/1/004 |
| Electronic ISSN | 1361-648X |
| Print ISSN | 0953-8984 |
| Журнал | Journal of Physics: Condensed Matter |
| Том | 10 |
| Первая страница | L27 |
| Последняя страница | L32 |
| Выпуск | 1 |
