Evolution of the surface roughness (dynamic scaling) and microstructure of sputter-deposited Ag<sub>75</sub>Co<sub>25</sub> granular films
R Mustafa Öksüzoglu; Ayhan Elmali; Thomas E Weirich; Hartmut Fuess; Horst Hahn; R Mustafa Öksüzoglu; Institute for Materials Science, Darmstadt University of Technology, Petersenstrasse 23, D-64287 Darmstadt, Germany; Ayhan Elmali; Institute for Materials Science, Darmstadt University of Technology, Petersenstrasse 23, D-64287 Darmstadt, Germany; Thomas E Weirich; Institute for Materials Science, Darmstadt University of Technology, Petersenstrasse 23, D-64287 Darmstadt, Germany; Hartmut Fuess; Institute for Materials Science, Darmstadt University of Technology, Petersenstrasse 23, D-64287 Darmstadt, Germany; Horst Hahn; Institute for Materials Science, Darmstadt University of Technology, Petersenstrasse 23, D-64287 Darmstadt, Germany
Журнал:
Journal of Physics: Condensed Matter
Дата:
2000-11-06
Аннотация:
X-ray specular-reflectivity measurements have been carried out on Ag<sub>75</sub>Co<sub>25</sub> granular films which were sputter-deposited on Si substrates with SiO<sub>2</sub> surface, to investigate the evolution of surface roughness as a function of film thickness. X-ray reflectivity data were recorded for thicknesses of Ag<sub>75</sub>Co<sub>25</sub> thin films ranging from 8.8-116.9 nm. A power law behaviour of the interfacial width of a growing interface in sputtered-deposited Ag<sub>75</sub>Co<sub>25</sub> granular films was observed. The scaling exponent was found to be β = 0.43±0.01 and compared with theoretical calculations. High resolution electron microscopy revealed the presence of crystalline particles of fcc Ag and hcp Co. The structural and magnetoresistive properties of the films are discussed.
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