Surface core-level shifts for the (110) cleavage face of III-V semiconductors: InAs(110)
A B McLean; A B McLean; IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
Журнал:
Journal of Physics: Condensed Matter
Дата:
1990-01-29
Аннотация:
The lineshapes of the In 4d and As 3d core-levels in InAs(110) have been studied using least squares analysis and the surface core-level shifts are found to be +0.28+or-0.02 and -0.30+or-0.02 eV respectively. Consequently, the surface core-level shifts have now been determined for the entire family of III-V semiconductor surfaces which includes GaX(110) and InX(110), where X=P, As and Sb. It is shown that the quantity Delta E<sub>C</sub>- Delta E<sub>A</sub>, where Delta E<sub>C</sub> is the cation surface core-level shift and Delta E<sub>A</sub> is the anion surface core-level shift, exhibits a systematic dependence upon the semiconductor ionicity.
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