Автор |
A B McLean |
Дата выпуска |
1990-01-29 |
dc.description |
The lineshapes of the In 4d and As 3d core-levels in InAs(110) have been studied using least squares analysis and the surface core-level shifts are found to be +0.28+or-0.02 and -0.30+or-0.02 eV respectively. Consequently, the surface core-level shifts have now been determined for the entire family of III-V semiconductor surfaces which includes GaX(110) and InX(110), where X=P, As and Sb. It is shown that the quantity Delta E<sub>C</sub>- Delta E<sub>A</sub>, where Delta E<sub>C</sub> is the cation surface core-level shift and Delta E<sub>A</sub> is the anion surface core-level shift, exhibits a systematic dependence upon the semiconductor ionicity. |
Формат |
application.pdf |
Издатель |
Institute of Physics Publishing |
Название |
Surface core-level shifts for the (110) cleavage face of III-V semiconductors: InAs(110) |
Тип |
lett |
DOI |
10.1088/0953-8984/2/4/022 |
Electronic ISSN |
1361-648X |
Print ISSN |
0953-8984 |
Журнал |
Journal of Physics: Condensed Matter |
Том |
2 |
Первая страница |
1027 |
Последняя страница |
1032 |
Аффилиация |
A B McLean; IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA |
Выпуск |
4 |