Heterojunctions of solid C<sub>60</sub> and crystalline silicon: rectifying properties and energy-band models
K M Chen; Y Q Jia; S X Jin; K Wu; W B Zhao; C Y Li; Z N Gu; X H Zhou; K M Chen; Dept. of Phys., Beijing Univ., China; Y Q Jia; Dept. of Phys., Beijing Univ., China; S X Jin; Dept. of Phys., Beijing Univ., China; K Wu; Dept. of Phys., Beijing Univ., China; W B Zhao; Dept. of Phys., Beijing Univ., China; C Y Li; Dept. of Phys., Beijing Univ., China; Z N Gu; Dept. of Phys., Beijing Univ., China; X H Zhou; Dept. of Phys., Beijing Univ., China
Журнал:
Journal of Physics: Condensed Matter
Дата:
1995-04-03
Аннотация:
Heterojunctions of undoped solid C<sub>60</sub> and n- or p-type-doped crystalline Si have been obtained. Current-voltage measurements show that both C<sub>60</sub>/n-Si and C<sub>60</sub>/p-Si contacts are rectifying but their directions of rectification are opposite. Thermal activation measurements at a fixed forward bias show an exponential dependence of current on the reciprocal of temperature, from which we determine the effective barrier height as 0.30 eV for C<sub>60</sub>/n-Si and 0.48 eV for C<sub>60</sub>/p-Si. Using energy-band models for heterojunctions we assign values to the positions of the conduction and valence bands of the solid C<sub>60</sub> relative to those of crystalline Si and derive the electron affinity and band gap of solid C<sub>60</sub> film as 3.92 eV and <1.72 eV, respectively.
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