Мобильная версия

Доступно журналов:

3 288

Доступно статей:

3 891 637

 

Скрыть метаданые

Автор Xiangyang Ma
Автор Lideng Chen
Автор Zhenguo Ji
Автор Hongnian Yao
Автор Duanlin Que
Дата выпуска 1995-04-03
dc.description This paper reports the photoluminescence (PL) of a silicon oxide film formed by anodization in the electropolishing region in HF solution. The PL is preliminarily believed to be due to certain light-emitting centres in the silicon oxide film. In addition, the paper suggests that not all the PL of anodized silicon formed in HF solution can be solely ascribed to the porous silicon.
Формат application.pdf
Издатель Institute of Physics Publishing
Название Photoluminescence of a silicon oxide film formed by anodization in the electropolishing region in HF solution
Тип paper
DOI 10.1088/0953-8984/7/14/026
Electronic ISSN 1361-648X
Print ISSN 0953-8984
Журнал Journal of Physics: Condensed Matter
Том 7
Первая страница 2901
Последняя страница 2907
Аффилиация Xiangyang Ma; Nat. Lab. of High Purity Silicon, Zhejiang Univ., Hangzhou, China
Аффилиация Lideng Chen; Nat. Lab. of High Purity Silicon, Zhejiang Univ., Hangzhou, China
Аффилиация Zhenguo Ji; Nat. Lab. of High Purity Silicon, Zhejiang Univ., Hangzhou, China
Аффилиация Hongnian Yao; Nat. Lab. of High Purity Silicon, Zhejiang Univ., Hangzhou, China
Аффилиация Duanlin Que; Nat. Lab. of High Purity Silicon, Zhejiang Univ., Hangzhou, China
Выпуск 14

Скрыть метаданые