The effect of photo-oxidation on the sticking and reactivity of Ag on amorphous
J Hugh Horton; Christopher Hardacre; Christopher J Baddeley; Geoffrey D Moggridge; R Mark Ormerod; Richard M Lambert; J Hugh Horton; Department of Chemistry, University of Cambridge, Cambridge CB2 1EW, UK; Christopher Hardacre; Department of Chemistry, University of Cambridge, Cambridge CB2 1EW, UK; Christopher J Baddeley; Department of Chemistry, University of Cambridge, Cambridge CB2 1EW, UK; Geoffrey D Moggridge; Department of Chemistry, University of Cambridge, Cambridge CB2 1EW, UK; R Mark Ormerod; Department of Chemistry, University of Cambridge, Cambridge CB2 1EW, UK; Richard M Lambert; Department of Chemistry, University of Cambridge, Cambridge CB2 1EW, UK
Журнал:
Journal of Physics: Condensed Matter
Дата:
1996-02-05
Аннотация:
Photo-oxidation of amorphous films illuminated by band-gap radiation drastically alters the growth mode and reactivity of subsequently deposited Ag. In the former case (monolayer/simultaneous multilayer growth) the Ag reacts with both Ge and S sites. In the latter case (Stranski - Krastanov growth) Ge sites are selectively oxidized and film growth proceeds by Ag nucleation at the unoxidized S sites. The behaviour is very different from that reported earlier for Zn deposition on , where photo-oxidation results in very large changes in metal sticking probability. XPS, XAES and EXAFS data provide the basis for understanding both this phenomenon and the very different photodiffusion behaviour of Zn and Ag in .
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