Автор |
J Hugh Horton |
Автор |
Christopher Hardacre |
Автор |
Christopher J Baddeley |
Автор |
Geoffrey D Moggridge |
Автор |
R Mark Ormerod |
Автор |
Richard M Lambert |
Дата выпуска |
1996-02-05 |
dc.description |
Photo-oxidation of amorphous films illuminated by band-gap radiation drastically alters the growth mode and reactivity of subsequently deposited Ag. In the former case (monolayer/simultaneous multilayer growth) the Ag reacts with both Ge and S sites. In the latter case (Stranski - Krastanov growth) Ge sites are selectively oxidized and film growth proceeds by Ag nucleation at the unoxidized S sites. The behaviour is very different from that reported earlier for Zn deposition on , where photo-oxidation results in very large changes in metal sticking probability. XPS, XAES and EXAFS data provide the basis for understanding both this phenomenon and the very different photodiffusion behaviour of Zn and Ag in . |
Формат |
application.pdf |
Издатель |
Institute of Physics Publishing |
Название |
The effect of photo-oxidation on the sticking and reactivity of Ag on amorphous |
Тип |
paper |
DOI |
10.1088/0953-8984/8/6/011 |
Electronic ISSN |
1361-648X |
Print ISSN |
0953-8984 |
Журнал |
Journal of Physics: Condensed Matter |
Том |
8 |
Первая страница |
707 |
Последняя страница |
718 |
Аффилиация |
J Hugh Horton; Department of Chemistry, University of Cambridge, Cambridge CB2 1EW, UK |
Аффилиация |
Christopher Hardacre; Department of Chemistry, University of Cambridge, Cambridge CB2 1EW, UK |
Аффилиация |
Christopher J Baddeley; Department of Chemistry, University of Cambridge, Cambridge CB2 1EW, UK |
Аффилиация |
Geoffrey D Moggridge; Department of Chemistry, University of Cambridge, Cambridge CB2 1EW, UK |
Аффилиация |
R Mark Ormerod; Department of Chemistry, University of Cambridge, Cambridge CB2 1EW, UK |
Аффилиация |
Richard M Lambert; Department of Chemistry, University of Cambridge, Cambridge CB2 1EW, UK |
Выпуск |
6 |