A system for high pressure preparation and UHV characterization of surface reactions
P H F Reijnen; U van Slooten; A P de Jongh; J H M Kuijper; A W Kleyn; P H F Reijnen; FOM-Inst. for Atomic & Molecular Phys., Amsterdam, Netherlands; U van Slooten; FOM-Inst. for Atomic & Molecular Phys., Amsterdam, Netherlands; A P de Jongh; FOM-Inst. for Atomic & Molecular Phys., Amsterdam, Netherlands; J H M Kuijper; FOM-Inst. for Atomic & Molecular Phys., Amsterdam, Netherlands; A W Kleyn; FOM-Inst. for Atomic & Molecular Phys., Amsterdam, Netherlands
Журнал:
Measurement Science and Technology
Дата:
1990-11-01
Аннотация:
An apparatus is presented which allows in situ high pressure dosing of gases at surfaces and subsequent characterization of the surface in UHV by established surface sensitive tools. A sample mounting has been constructed that allows dosing of corrosive gases at elevated temperatures and that allows pick-up by a sample transfer rod for transfer to an ion scattering apparatus.
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