| Автор | P H F Reijnen |
| Автор | U van Slooten |
| Автор | A P de Jongh |
| Автор | J H M Kuijper |
| Автор | A W Kleyn |
| Дата выпуска | 1990-11-01 |
| dc.description | An apparatus is presented which allows in situ high pressure dosing of gases at surfaces and subsequent characterization of the surface in UHV by established surface sensitive tools. A sample mounting has been constructed that allows dosing of corrosive gases at elevated temperatures and that allows pick-up by a sample transfer rod for transfer to an ion scattering apparatus. |
| Формат | application.pdf |
| Издатель | Institute of Physics Publishing |
| Название | A system for high pressure preparation and UHV characterization of surface reactions |
| Тип | paper |
| DOI | 10.1088/0957-0233/1/11/018 |
| Electronic ISSN | 1361-6501 |
| Print ISSN | 0957-0233 |
| Журнал | Measurement Science and Technology |
| Том | 1 |
| Первая страница | 1244 |
| Последняя страница | 1246 |
| Аффилиация | P H F Reijnen; FOM-Inst. for Atomic & Molecular Phys., Amsterdam, Netherlands |
| Аффилиация | U van Slooten; FOM-Inst. for Atomic & Molecular Phys., Amsterdam, Netherlands |
| Аффилиация | A P de Jongh; FOM-Inst. for Atomic & Molecular Phys., Amsterdam, Netherlands |
| Аффилиация | J H M Kuijper; FOM-Inst. for Atomic & Molecular Phys., Amsterdam, Netherlands |
| Аффилиация | A W Kleyn; FOM-Inst. for Atomic & Molecular Phys., Amsterdam, Netherlands |
| Выпуск | 11 |
