| Автор | Hae Nuh Chu |
| Автор | A R Lefkow |
| Автор | E A Den Hartog |
| Автор | L W Anderson |
| Автор | M G Lagally |
| Автор | J E Lawler |
| Дата выпуска | 1992-08-01 |
| dc.description | Diamond films have been grown on a Si substrate that acts as the anode of a tubular DC hollow cathode discharge, using CH<sub>4</sub>-H<sub>2</sub> as the feed gas mixture. Changes in film morphology were observed for different electrode spacing but the film morphology was nearly independent of the substrate temperature. This suggests that the film morphology depends on the concentration of free radicals reaching the anode. |
| Формат | application.pdf |
| Издатель | Institute of Physics Publishing |
| Название | The temperature dependence of diamond film morphology |
| Тип | paper |
| DOI | 10.1088/0963-0252/1/3/007 |
| Electronic ISSN | 1361-6595 |
| Print ISSN | 0963-0252 |
| Журнал | Plasma Sources Science and Technology |
| Том | 1 |
| Первая страница | 187 |
| Последняя страница | 189 |
| Аффилиация | Hae Nuh Chu; Wisconsin Univ., Madison, WI, USA |
| Аффилиация | A R Lefkow; Wisconsin Univ., Madison, WI, USA |
| Аффилиация | E A Den Hartog; Wisconsin Univ., Madison, WI, USA |
| Аффилиация | L W Anderson; Wisconsin Univ., Madison, WI, USA |
| Аффилиация | M G Lagally; Wisconsin Univ., Madison, WI, USA |
| Аффилиация | J E Lawler; Wisconsin Univ., Madison, WI, USA |
| Выпуск | 3 |
