Мобильная версия

Доступно журналов:

3 288

Доступно статей:

3 891 637

 

Скрыть метаданые

Автор S Ostapenko
Автор Yu M Suleimanov
Автор I Tarasov
Автор S Lulu
Автор S E Saddow
Дата выпуска 2002-12-09
dc.description We performed non-contact and non-destructive spatially resolved characterization of traps and recombination centres in two-inch-diameter p-type 4H-SiC wafers using thermally stimulated luminescence (TSL) and scanning room temperature photoluminescence (PL). The TSL glow-curve maximum is located at about 190 K for the Al-doped wafers and the TSL spectrum has a maximum at 1.8 eV, which coincides with the spectrum of the red PL band in the same crystal. The TSL intensity exhibits a noticeable inhomogeneity across the wafers. The spatial distribution shows a negative contrast compared to PL maps, indicating a variation of concentration of the TSL centres across the wafer. The origin of the centres is discussed.
Формат application.pdf
Издатель Institute of Physics Publishing
Название Thermally stimulated luminescence in full-size 4H-SiC wafers
Тип paper
DOI 10.1088/0953-8984/14/48/392
Electronic ISSN 1361-648X
Print ISSN 0953-8984
Журнал Journal of Physics: Condensed Matter
Том 14
Первая страница 13381
Последняя страница 13386
Аффилиация S Ostapenko; University of South Florida, Center for Microelectronics Research, 4202 E Fowler Avenue, Tampa, FL 33620, USA
Аффилиация Yu M Suleimanov; University of South Florida, Center for Microelectronics Research, 4202 E Fowler Avenue, Tampa, FL 33620, USA
Аффилиация I Tarasov; University of South Florida, Center for Microelectronics Research, 4202 E Fowler Avenue, Tampa, FL 33620, USA
Аффилиация S Lulu; University of South Florida, Center for Microelectronics Research, 4202 E Fowler Avenue, Tampa, FL 33620, USA
Аффилиация S E Saddow; University of South Florida, Center for Microelectronics Research, 4202 E Fowler Avenue, Tampa, FL 33620, USA
Выпуск 48

Скрыть метаданые