Nanoimprint lithography: challenges and prospects
S Zankovych; T Hoffmann; J Seekamp; J-U Bruch; C M Sotomayor Torres
Журнал:
Nanotechnology
Дата:
2001-06-01
Аннотация:
We review the salient aspects of nanoimprint lithography and consider the challenges it faces in becoming a standard fabrication technique, such as costs and throughput. We discuss material issues such as visco-elasticity and functionality of the printed material. By way of an illustration, we present printing results of 50 nm features over a 2×2 cm<sup>2</sup> area which are reproducible with high fidelity. Data of printing 15 nm features in PMMA using a Cr stamp was obtained.
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