| Автор | S Zankovych |
| Автор | T Hoffmann |
| Автор | J Seekamp |
| Автор | J-U Bruch |
| Автор | C M Sotomayor Torres |
| Дата выпуска | 2001-06-01 |
| dc.description | We review the salient aspects of nanoimprint lithography and consider the challenges it faces in becoming a standard fabrication technique, such as costs and throughput. We discuss material issues such as visco-elasticity and functionality of the printed material. By way of an illustration, we present printing results of 50 nm features over a 2×2 cm<sup>2</sup> area which are reproducible with high fidelity. Data of printing 15 nm features in PMMA using a Cr stamp was obtained. |
| Формат | application.pdf |
| Издатель | Institute of Physics Publishing |
| Название | Nanoimprint lithography: challenges and prospects |
| Тип | paper |
| DOI | 10.1088/0957-4484/12/2/303 |
| Electronic ISSN | 1361-6528 |
| Print ISSN | 0957-4484 |
| Журнал | Nanotechnology |
| Том | 12 |
| Первая страница | 91 |
| Последняя страница | 95 |
| Выпуск | 2 |
