Change from micrometre to nanometre size for diamond grains by plasma chemical vapour deposition
H Y Zhou; R J Zhan; X D Zhu; X H Wen; X Chen; H Y Zhou; Department of Modern Physics, University of Science and Technology of China, Hefei, Anhui 230026, People’s Republic of China; R J Zhan; Department of Modern Physics, University of Science and Technology of China, Hefei, Anhui 230026, People’s Republic of China; X D Zhu; Department of Modern Physics, University of Science and Technology of China, Hefei, Anhui 230026, People’s Republic of China; X H Wen; Department of Modern Physics, University of Science and Technology of China, Hefei, Anhui 230026, People’s Republic of China; X Chen; Department of Modern Physics, University of Science and Technology of China, Hefei, Anhui 230026, People’s Republic of China
Журнал:
Nanotechnology
Дата:
2004-11-01
Аннотация:
Nanocrystalline diamond (NCD) films were deposited using CH<sub>4</sub> and H<sub>2</sub> gas mixtures by the electron assisted chemical vapour deposition (EACVD) method at 640 and 400 °C, and microcrystalline diamond film was simultaneously synthesized at 890 °C. The size of NCD was estimated as about 8–100 nm according to electron micrographs and the full width at half maximum of diamond features of x-ray diffraction spectra. We have investigated the local gas environments where diamond films were deposited using a quadrupole mass spectrometer. It shows that the growth temperature and local gas environment are two important factors influencing diamond grain size.
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