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Автор Zhou, Wei
Автор Zhu, Yan
Автор Ji, Ting
Автор Hou, Xiaoyuan
Автор Cai, Qun
Дата выпуска 2006-02-14
dc.description Erbium deposited on vicinal Si(001) at room temperature and postannealed at 630 °C is observed to form self-assembled erbium silicide nanowires with a single orientation. In the same growth conditions, the nanowires formed on the flat Si(001) surface possess two orthogonal orientations. The growths and evolutions of nanowires on vicinal and flat Si(001) are studied by scanning tunnelling microscopy and compared with each other. The nanowires on both vicinal and flat surfaces undergo a ripening process at the late growth stage, which is considered to be affected by coalescence and strain.
Формат application.pdf
Издатель Institute of Physics Publishing
Копирайт IOP Publishing Ltd
Название Formation and evolution of erbium silicide nanowires on vicinal and flat Si(001)
Тип paper
DOI 10.1088/0957-4484/17/3/040
Electronic ISSN 1361-6528
Print ISSN 0957-4484
Журнал Nanotechnology
Том 17
Первая страница 852
Последняя страница 858
Аффилиация Cai, Qun;
Аффилиация Zhou, Wei; Surface Physics Laboratory (National Key Laboratory), Fudan University, Shanghai 200433, People’s Republic of China
Аффилиация Zhu, Yan; Surface Physics Laboratory (National Key Laboratory), Fudan University, Shanghai 200433, People’s Republic of China
Аффилиация Ji, Ting; Surface Physics Laboratory (National Key Laboratory), Fudan University, Shanghai 200433, People’s Republic of China
Аффилиация Hou, Xiaoyuan; Surface Physics Laboratory (National Key Laboratory), Fudan University, Shanghai 200433, People’s Republic of China
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