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Автор Wong, P S
Автор Liang, B L
Автор Dorogan, V G
Автор Albrecht, A R
Автор Tatebayashi, J
Автор He, X
Автор Nuntawong, N
Автор Mazur, Yu I
Автор Salamo, G J
Автор Brueck, S R J
Автор Huffaker, D L
Дата выпуска 2008-10-22
dc.description InAs quantum dots embedded in InGaAs quantum well (DWELL: dots-in-the-well) structures grown on nanopatterned GaAs pyramids and planar GaAs(001) surface are comparatively investigated. Photoluminescence (PL) measurements demonstrate that the DWELL structure grown on the GaAs pyramids exhibits a broad quantum well PL band (full width at half-maximum ∼ 90 meV) and a higher quantum dot emission efficiency than the DWELL structure grown on the planar GaAs(001) substrate. These properties are attributed to the InGaAs quantum well with distributed thickness profile on the faceted GaAs pyramids, which introduces a tapered energy band structure and enhances carrier capture into the quantum dots.
Формат application.pdf
Издатель Institute of Physics Publishing
Копирайт IOP Publishing Ltd
Название Improved photoluminescence efficiency of patterned quantum dots incorporating a dots-in-the-well structure
Тип paper
DOI 10.1088/0957-4484/19/43/435710
Electronic ISSN 1361-6528
Print ISSN 0957-4484
Журнал Nanotechnology
Том 19
Первая страница 435710
Последняя страница 435714
Аффилиация Wong, P S; Electrical Engineering Department, University of California at Los Angeles, Los Angeles, CA 90095, USA
Аффилиация Liang, B L; Electrical Engineering Department, University of California at Los Angeles, Los Angeles, CA 90095, USA
Аффилиация Dorogan, V G; Department of Physics, University of Arkansas, Fayetteville, AR 72701, USA
Аффилиация Albrecht, A R; Center for High Technology Materials, University of New Mexico, Albuquerque, NM 87106, USA
Аффилиация Tatebayashi, J; Electrical Engineering Department, University of California at Los Angeles, Los Angeles, CA 90095, USA
Аффилиация He, X; Center for High Technology Materials, University of New Mexico, Albuquerque, NM 87106, USA
Аффилиация Nuntawong, N; Center for High Technology Materials, University of New Mexico, Albuquerque, NM 87106, USA
Аффилиация Mazur, Yu I; Department of Physics, University of Arkansas, Fayetteville, AR 72701, USA
Аффилиация Salamo, G J; Department of Physics, University of Arkansas, Fayetteville, AR 72701, USA
Аффилиация Brueck, S R J; Center for High Technology Materials, University of New Mexico, Albuquerque, NM 87106, USA
Аффилиация Huffaker, D L; Electrical Engineering Department, University of California at Los Angeles, Los Angeles, CA 90095, USA
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