Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: II. Ar/N<sub>2</sub> plasma with graphite nozzle
A de Graaf; E Aldea; G Dinescu; M C M van de Sanden
Журнал:
Plasma Sources Science and Technology
Дата:
2001-08-01
Аннотация:
The chemistry of an argon/nitrogen thermal plasma expanding through a graphite nozzle is investigated in order to unravel the role of plasma species in the deposition (1-3 nm s<sup>-1</sup> rate) of non-hydrogenated amorphous carbon nitride (a-C:N) films. The spectral emission of plasma species is studied and is used in combination with mass spectrometry and nozzle temperature measurements to distinguish possible mechanisms of species production and excitation.
108.8Кб