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Автор A de Graaf
Автор E Aldea
Автор G Dinescu
Автор M C M van de Sanden
Дата выпуска 2001-08-01
dc.description The chemistry of an argon/nitrogen thermal plasma expanding through a graphite nozzle is investigated in order to unravel the role of plasma species in the deposition (1-3 nm s<sup>-1</sup> rate) of non-hydrogenated amorphous carbon nitride (a-C:N) films. The spectral emission of plasma species is studied and is used in combination with mass spectrometry and nozzle temperature measurements to distinguish possible mechanisms of species production and excitation.
Формат application.pdf
Издатель Institute of Physics Publishing
Название Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: II. Ar/N<sub>2</sub> plasma with graphite nozzle
Тип paper
DOI 10.1088/0963-0252/10/3/317
Electronic ISSN 1361-6595
Print ISSN 0963-0252
Журнал Plasma Sources Science and Technology
Том 10
Первая страница 524
Последняя страница 529
Выпуск 3

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