Мобильная версия

Доступно журналов:

3 288

Доступно статей:

3 891 637

 

Скрыть метаданые

Автор Hsing, Chang Hui
Автор Chu-en, Han
Автор Hsun, Wang Wen
Автор Yi, Chen Ju
Дата выпуска 1979
dc.description AbstractAn experimental 400 Kev heavy ion implanter has been constructed and put into operation in the Department of Physics, the Peking Normal University. The equipment works on a system of acceleration, analysis, scan, and acceleration (or deceleration). It is composed of the radiofrequency heavy ion source, the front accelerating system, the double focusing symmetrical magnet, the deflexion scanning system, the post-accelerating tube, and the target chamber. The deflecting angle of the magnet is 90°. At present, more than twenty different species of ion beam, such as B, P, As, Al, Mg, Zn, Hg, etc. have been extracted. The extracted ions are used in research work on semiconductors, metals, and superconductive materials. The beam current on the target ranges between 10 μA and 200 μA, and the doping uniformity is ±1.4%.
Формат application.pdf
Издатель Taylor & Francis Group
Копирайт Copyright Taylor and Francis Group, LLC
Название 400 Kev heavy ion implanter
Тип research-article
DOI 10.1080/00337577908245992
Print ISSN 0033-7579
Журнал Radiation Effects
Том 44
Первая страница 181
Последняя страница 183
Аффилиация Hsing, Chang Hui; Peking Normal University
Аффилиация Chu-en, Han; Peking Normal University
Аффилиация Hsun, Wang Wen; Peking Normal University
Аффилиация Yi, Chen Ju; Peking Normal University
Выпуск 1-4
Библиографическая ссылка E1—Karch, A. B. and El—Karch, J. C. 1970. Electron Beams. Lenses and Optics., Vol. I Academic,
Библиографическая ссылка Septier, A. 1967. Focusing of Charged Particles, Vol. II, New York: Academic Press.

Скрыть метаданые