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Автор Charbonnieras, A. R.
Автор Tellier, C. R.
Дата выпуска 1999
dc.description This paper is devoted to the theoretical study of the influence of the temperature and of the doping on the piezoresistance of N-type silicon. In the first step the fractional change in the resistivity caused by stresses is calculated in the framework of a multivalley model using a kinetic transport formulation based on the Boltzmann transport equation. In the second step shifts in the minima of the conduction band and the resulting shift of the Fermi level are expressed in terms of deformation potentials and of stresses. General expressions for the fundamental linear, π<sub>11</sub> and π<sub>12</sub>, and non-linear, π<sub>111</sub>, π<sub>112</sub>, π<sub>122</sub> and π<sub>123</sub>, piezoresistance coefficients are then derived. Plots of the non-linear piezoresistance coefficients against the reduced shift of the Fermi level or against temperature allow us to characterize the influence of doping and temperature. Finally some attempts are made to estimate the non-linearity for heavily doped semiconductor gauges.
Формат application.pdf
Издатель EDP Sciences
Копирайт © EDP Sciences, 1999
Название A kinetic formulation of piezoresistance in N-type silicon: Application to non-linear effects
Тип research-article
DOI 10.1051/epjap:1999192
Electronic ISSN 1286-0050
Print ISSN 1286-0042
Журнал The European Physical Journal Applied Physics
Том 7
Первая страница 1
Последняя страница 11
Аффилиация Charbonnieras A. R.; Laboratoire de Chronométrie Électronique et Piezoélectricité, École Nationale Supérieure de Mécanique et des Microtechniques, 26 chemin de l'Épitaphe, 25030 Besançon Cedex, France
Аффилиация Tellier C. R.; Laboratoire de Chronométrie Électronique et Piezoélectricité, École Nationale Supérieure de Mécanique et des Microtechniques, 26 chemin de l'Épitaphe, 25030 Besançon Cedex, France
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