Мобильная версия

Доступно журналов:

3 288

Доступно статей:

3 891 637

 

Cambridge University Press по дате публикации

Отсортировать по: Порядок: Результаты:

  • Yasuda, T.; Lee, D. R.; Bjorkman, C. H.; Ma, Y.; Lucovsky, G.; Emmerichs, U.; Meyer, C.; Leo, K.; Kurz, H.; Yasuda T.; North Carolina State University; Lee D. R.; North Carolina State University; Bjorkman C. H.; North Carolina State University; Ma Y.; North Carolina State University; Lucovsky G.; North Carolina State University; Emmerichs U.; Institute of Semiconductor Electronics II, Rheinisch-Westfalishe Technische Hochschule, 5100 Aachen, Germany; Meyer C.; Institute of Semiconductor Electronics II, Rheinisch-Westfalishe Technische Hochschule, 5100 Aachen, Germany; Leo K.; Institute of Semiconductor Electronics II, Rheinisch-Westfalishe Technische Hochschule, 5100 Aachen, Germany; Kurz H.; Institute of Semiconductor Electronics II, Rheinisch-Westfalishe Technische Hochschule, 5100 Aachen, Germany (Cambridge University Press, 1993)
  • Kavanagh, K. L.; Cargill, G. S.; Boehme, R. F.; Chang, J. C. P.; Kavanagh K. L.; University of California at San Diego; Cargill G. S.; IBM Research Division, T. J. Watson Research Center, Yorktown Heights, New York 10598; Boehme R. F.; IBM Research Division, T. J. Watson Research Center, Yorktown Heights, New York 10598; Chang J. C. P.; University of California at San Diego (Cambridge University Press, 1989)
  • Melngailis, John; Blauner, Patricia G.; Melngailis John; Research Laboratory of Electronics, M.I.T., 77 Massachusetts Avenue, Cambridge, MA 02139; Blauner Patricia G.; Research Laboratory of Electronics, M.I.T., 77 Massachusetts Avenue, Cambridge, MA 02139 (Cambridge University Press, 1989)
  • Wong, H.; Qian, X. Y.; Carl, D.; Cheung, N. W.; Lieberman, M. A.; Brown, I. G.; Yu, K. M.; Wong H.; University of California; Qian X. Y.; University of California; Carl D.; University of California; Cheung N. W.; University of California; Lieberman M. A.; University of California; Brown I. G.; Lawrence Berkeley Laboratory, Berkeley, CA 94720.; Yu K. M.; Lawrence Berkeley Laboratory, Berkeley, CA 94720. (Cambridge University Press, 1989)
  • Spitznagel, J. A.; Wood, Susan; Choyke, W. J.; Devaty, R. P.; Ruan, J.; Spitznagel J. A.; Westinghouse Science & Technology Center, 1310 Beulah Rd., Pittsburgh. PA 15234; Wood Susan; Westinghouse Science & Technology Center, 1310 Beulah Rd., Pittsburgh. PA 15234; Choyke W. J.; University of Pittsburgh; Devaty R. P.; University of Pittsburgh; Ruan J.; University of Pittsburgh (Cambridge University Press, 1989)
  • Myers, E.; Hren, J. J.; Myers E.; Department of Electrical and Computer Engineering North Carolina State University; Hren J. J.; Department of Electrical and Computer Engineering North Carolina State University (Cambridge University Press, 1989)
  • Atwater, Harry A.; Brown, Walter L.; Atwater Harry A.; California Institute of Technology; Brown Walter L.; A.T.&T. Bell Laboratories, Murray Hill, N.J. 07974. (Cambridge University Press, 1989)
  • Swart, Pieter L.; Lacquet, Bea M.; Grobler, Michael F.; Swart Pieter L.; Rand Afrikaans University; Lacquet Bea M.; Rand Afrikaans University; Grobler Michael F.; Rand Afrikaans University (Cambridge University Press, 1989)
  • Fan, D.; Jaccodine, R. J.; Fan D.; Lehigh University; Jaccodine R. J.; Lehigh University (Cambridge University Press, 1989)
  • Jackson, Kenneth A.; Jackson Kenneth A.; AT&T Bell Laboratories, Murray Hill, NJ 07974 (Cambridge University Press, 1989)
  • Smith, P. R.; Graves, J. A.; Rhodes, C. G.; Smith P. R.; Materials Directorate, Wright Laboratory, Wright-Patterson AFB, OH 45433-6533; Graves J. A.; Rockwell International Corp. Science Center, Thousand Oaks, CA. 91360-0085; Rhodes C. G.; Rockwell International Corp. Science Center, Thousand Oaks, CA. 91360-0085 (Cambridge University Press, 1992)
  • McCarthy, Gregory J.; Hassett, David J.; Bender, Jason A.; McCarthy Gregory J.; North Dakota State University; Hassett David J.; University of North Dakota; Bender Jason A.; North Dakota State University (Cambridge University Press, 1991)
  • Usui, Hiroaki; Kashihara, Kiyoshi; Tanaka, Kuniaki; Miyata, Seizo; Usui Hiroaki; Department of Material Systems Engineering, Tokyo University of Agriculture and Technology, Nakamachi, Koganei, Tokyo 184, Japan; Kashihara Kiyoshi; Department of Material Systems Engineering, Tokyo University of Agriculture and Technology, Nakamachi, Koganei, Tokyo 184, Japan; Tanaka Kuniaki; Department of Material Systems Engineering, Tokyo University of Agriculture and Technology, Nakamachi, Koganei, Tokyo 184, Japan; Miyata Seizo; Department of Material Systems Engineering, Tokyo University of Agriculture and Technology, Nakamachi, Koganei, Tokyo 184, Japan (Cambridge University Press, 1993)
  • Solem, Jody K.; McCarthy, Gregory J.; Solem Jody K.; North Dakota State University; McCarthy Gregory J.; North Dakota State University (Cambridge University Press, 1991)
  • Bannister, M. K.; Spearing, S. M.; Löfvander, J. P. A.; Graef, M. De; Bannister M. K.; University of California; Spearing S. M.; University of California; Löfvander J. P. A.; University of California; Graef M. De; University of California (Cambridge University Press, 1992)
  • Gottmann, Jean; Gottmann Jean; d'Etudes Politiques of the University of Paris and a Member of the Institute for Advanced Study at Princeton (Cambridge University Press, 1951)
  • Chen, Y.; Park, C.K.; Silsbee, M.R.; Roy, D.M.; Chen Y.; University Park; Park C.K.; University Park; Silsbee M.R.; University Park; Roy D.M.; University Park (Cambridge University Press, 1991)
  • Lee, R. J.; Draper, E. A.; Skalny, J.; Lee R. J.; RJ Lee Group, Inc; Draper E. A.; RJ Lee Group, Inc; Skalny J.; RJ Lee Group, Inc (Cambridge University Press, 1991)
  • Jiang, W.; Roy, D.M.; Jiang W.; University Park; Roy D.M.; University Park (Cambridge University Press, 1991)
  • Chen, Samuel; Lee, S.-Tong; Braunstein, G.; Rajeswaran, G.; Fellinger, P.; Chen Samuel; Corporate Research Laboratories, Eastman Kodak Company, Rochester, New York 14650; Lee S.-Tong; Corporate Research Laboratories, Eastman Kodak Company, Rochester, New York 14650; Braunstein G.; Corporate Research Laboratories, Eastman Kodak Company, Rochester, New York 14650; Rajeswaran G.; Corporate Research Laboratories, Eastman Kodak Company, Rochester, New York 14650; Fellinger P.; Corporate Research Laboratories, Eastman Kodak Company, Rochester, New York 14650 (Cambridge University Press, 1989)