Reactive sputtering of YBaCuO thin films on polycrystalline zirconia substrates: optimization results*
Degardin, A.; Bodin, C.; Dolin, C.; Kreisler, A.; Degardin A.; Laboratoire de Génie Électrique de Paris, Universités Paris VI et Paris XI (URA 127 CNRS), Supélec, Plateau du Moulon, 91190 Gif-sur-Yvette, France; Bodin C.; Laboratoire de Génie Électrique de Paris, Universités Paris VI et Paris XI (URA 127 CNRS), Supélec, Plateau du Moulon, 91190 Gif-sur-Yvette, France; Dolin C.; Unité mixte de Physique CNRS/Thomson-CSF (UMR 137), Domaine de Corbeville, 91404 Orsay, France; Kreisler A.; Laboratoire de Génie Électrique de Paris, Universités Paris VI et Paris XI (URA 127 CNRS), Supélec, Plateau du Moulon, 91190 Gif-sur-Yvette, France
Журнал:
The European Physical Journal Applied Physics
Дата:
1998
Аннотация:
In situ elaboration of YBaCuO thin films, on polycrystalline yttria doped zirconia substrates, has been optimized. A reactive sputtering model has been developed and the electrical conductivity of the substrate has been studied as a function of temperature and doping. The J <sub>c</sub> value of $\approx 3\times 10^4~{\rm A/cm}^2$ at 77 K, measured on microbridges, is among the best reported in the literature for this substrate type.
408.5Кб