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Автор Chen, Chau-Shu
Автор Chen, Chi-Ling
Автор Lue, Juh-Tzeng
Дата выпуска 2000
dc.description p-type (100) faceted diamond films can be successfully grown by bubbling H<sub>2</sub> through liquid B(OCH<sub>3</sub>)<sub>3</sub> during the Microwave Plasma Enhanced Chemical Vapour Deposition (MPCVD). Ramann spectra and scanning electron micrographs (SEM) convincingly illustrate that diamond-film growth on silicon substrates by a three-step process yields good uniformity with preferential orientation. The field emission current density of the boron doped diamond films can be enhanced from 0.7 μA/cm<sup>2</sup> for the as grown films to 140 μA/cm<sup>2</sup> at an applied field of 20 V/μm by hydrogenation treatment.
Формат application.pdf
Издатель EDP Sciences
Копирайт © EDP Sciences, 2000
Название The growth of boron doped (100) textured diamond films by three-step process
Тип research-article
DOI 10.1051/epjap:2000139
Electronic ISSN 1286-0050
Print ISSN 1286-0042
Журнал The European Physical Journal Applied Physics
Том 11
Первая страница 3
Последняя страница 8
Аффилиация Chen Chau-Shu; Department of Physics, and Department of Electrical Engineering, National Tsing Hua University, Hsinchu, Taiwan
Аффилиация Chen Chi-Ling; Department of Physics, and Department of Electrical Engineering, National Tsing Hua University, Hsinchu, Taiwan
Аффилиация Lue Juh-Tzeng; Department of Physics, and Department of Electrical Engineering, National Tsing Hua University, Hsinchu, Taiwan
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